- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/60 - Substrates
Patent holdings for IPC class G03F 1/60
Total number of patents in this class: 211
10-year publication summary
|
11
|
16
|
20
|
26
|
17
|
27
|
17
|
19
|
23
|
6
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Hoya Corporation | 2822 |
42 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
25 |
| Agc, Inc. | 4029 |
17 |
| Applied Materials, Inc. | 16587 |
11 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
11 |
| Carl Zeiss SMS Ltd. | 44 |
10 |
| Samsung Electronics Co., Ltd. | 131630 |
6 |
| Samsung Display Co., Ltd. | 30585 |
6 |
| Nikon Corporation | 7162 |
4 |
| ASML Netherlands B.V. | 6816 |
4 |
| Carl Zeiss SMT GmbH | 2646 |
4 |
| Kioxia Corporation | 9847 |
4 |
| SK Enpulse Co., Ltd. | 103 |
4 |
| LG Chem, Ltd. | 17205 |
3 |
| Innolux Corporation | 3151 |
3 |
| Asahi Glass Company, Limited | 2985 |
3 |
| Boe Technology Group Co., Ltd. | 35384 |
3 |
| Semes Co., Ltd. | 1119 |
3 |
| Toppan Photomask Co., Ltd. | 56 |
3 |
| Canon Inc. | 36841 |
2 |
| Other owners | 43 |